Sputtering Targets

By using more than 50 chemical elements, SOLAR is experienced in manufacturing sputtering targets made from over 3,000 alloys and 30 types of metal oxides.
SOLAR supplies thin films to various industries, such as data storage media, semiconductors and displays. Depending on the application, we can provide sputtering targets in various shapes and sizes.
SOLAR supplied sputtering targets, which come in various specifications.

for Data Storage Media Industry
for Semiconductor Industry
for Optoelectronic and Display Industry
Other Sputtering Targets

SOLAR is a world-class supplier of sputtering targets for storage media, providing sputtering targets for all media layers in this industry. SOLAR continuously improves product development capability to help customers pursue higher storage performance.

MDS Sputtering Target
ODS Sputtering Target

SOLAR's semiconductor-grade sputtering targets are supplied to wafer foundries, bumping and packaging/testing. Certified by major international vendors, our products feature both high purity and high precision.

Application	Products
Interconnection layer	Al, Cu or alloy targets
Electrode/Metallization layer	Au, Ag, Pt, Ti sputtering targets
Barrier layer	Ta, Ti, WTi sputtering targets
Gate Electrode	NiPt alloy targets
Memory	Ru, CoFe alloy targets

Introduction

Solar provides high-purity, high-density, large-size planar and rotary targets with excellent bonding ratio.
In addition to supplying ITO, Mo, and Al sputtering targets, Solar also offers a series of transparent conductive oxide (IXO®) products designed to meet various optoelectronic application requirements.

IXO Feature 1 Nonodule formation after sputtering

Solar’s patented IXO® series targets (IXO®-01 to IXO®-35) are Indium Oxide–based materials designed with optimized additive compositions.
These sputtering targets achieve resistivity levels equivalent to those of ITO targets and demonstrate no nodule formation after sputtering.

IXO Feature 2 lowresistivity and high transmittance

In terms of thin-film performance, IXO® coatings demonstrate both low resistivity and high transmittance without requiring high-temperature annealing.

THK(nm)		30	40	50	80	100	120	130	140	150
Rs (ohm/Sq)	IXO^®	124.6	90.3	73.5	46.7	37.9	31.4	28.8	26.8	24.9
Rs (ohm/Sq)	ITO	177.3	148.7	113.2	72.6	58.3	48.8	46.2	42.4	40.9
T% 550nm	IXO^®	89.0	84.9	82.9	85.0	90.9	95.1	94.8	92.6	89.3
T% 550nm	ITO	85.8	82.9	80.0	80.5	85.0	88.5	88.6	86.5	84.6
T% 800nm	IXO^®	95.0	92.8	91.8	87.9	87.2	87.4	88.4	89.5	90.7
T% 800nm	ITO	93.3	91.6	89.3	85.2	84.1	84.4	84.8	86.0	86.6

IXO Feature 3 flexibilityand do not leave etching residues

They also provide excellent film flexibility and do not leave etching residues when processed with oxalic acid, making them suitable for applications such as flexible films, TCOs for solar cells, and anti-reflection coatings.
Under R3 conditions, IXO films can withstand 200,000 bending cycles while maintaining their IXO properties.

Application	Product
TCO layer	ITO, IXO, In₂O₃, ZnO planar or rotary sputtering targets
Channel layer	IGZO planar or rotary sputtering targets
Reflection layer	Ag or Ag alloy targets
Anti-reflection layer	Nb₂O₅, TiO₂, Ta₂O₅, Si sputtering targets
Electrode layer	Al, Cu, Mo, Au, Ag or alloy targets
Barrier layer	Pt or Pt alloy targets
Customized function layer	Pure metal, metal alloy or metal oxide sputtering targets